Device for preparing nanometer powder and film material

The present invention discloses a method and apparatus for preparing a thin film nano-material powder, having the structure: crucible at the bottom of the vacuum chamber, the substrate means by the motor, the substrate holder and the substrate composition, substrate holder positioned within the vacuum chamber the top chamber, and a motor connected to the substrate holder, the substrate is mounted below the substrate holder; powder collector collecting port in communication with the vacuum chamber, the powder feeder is mounted on the inner wall of the vacuum chamber, the powder feeder flour above the opening located in the crucible, is opened into the vacuum chamber, outlet gas inlet and protection; connected to the high vacuum unit with a vacuum chamber, the positive and negative respectively, the vacuum cavity TIG welding gun silicon rectifier and crucible connection, the distance between 3-20mm TIG welding gun and the crucible is. The apparatus may be prepared and nanopowder may be deposited thin film material. Powders prepared with high purity, uniform particles; a uniformly deposited film, a high deposition rate, low cost of the device.