Diffusion processes in microwave discharge ion source and consequences on the upgrade of existing ion sources

Several experiments have shown that the insertion of insulator materials within the plasma chamber may lead to a general improvement of microwave discharge ion source performances. In particular, the insertion of alumina into the chamber walls and borum nitride into extraction and injection flanges permits to increase the extracted current and the proton fraction and leads to a general decrease in the beam ripple. These beneficial effects have been usually explained by considering the secondary electron emission of insulators hit by plasma electrons. This paper tries to illustrate that these effects can be explained by taking into account the modification of the diffusion regime induced by the insulator materials. This approach will be used to comment on the results obtained with the versatile ion source by changing the wall conditions.Several experiments have shown that the insertion of insulator materials within the plasma chamber may lead to a general improvement of microwave discharge ion source performances. In particular, the insertion of alumina into the chamber walls and borum nitride into extraction and injection flanges permits to increase the extracted current and the proton fraction and leads to a general decrease in the beam ripple. These beneficial effects have been usually explained by considering the secondary electron emission of insulators hit by plasma electrons. This paper tries to illustrate that these effects can be explained by taking into account the modification of the diffusion regime induced by the insulator materials. This approach will be used to comment on the results obtained with the versatile ion source by changing the wall conditions.