The optical element and optical arrangement so that

The invention relates to an optical element (14), in particular for EUV lithography, comprising: a substrate (15), applied one on the substrate (15) reflective coating (16), and a located between the substrate (15) and the reflective coating (16) extending electrically conductive coating (19) having at least a first, which is under tensile stress layer (22a) and at least one second, which is under compressive stress layer (22b). The invention also relates to an optical assembly, in particular a EUV lithography system, with at least such an optical element (14).