Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating

In this paper, an exposure energy analysis method which affects the precision of incremental grating lithography is proposed. Based on the analysis of the charge and discharge circuit of high voltage pulsed xenon lamp power supply, the change the characteristics of charge and discharge voltage and current circuits is calculated and analyzed by using the Thevenin's basic theorem. The complete charge and discharge voltage, circuit and exposure energy of the pulsed xenon discharge circuit were quantitatively analyzed. The grating energy model and grating fringes were established by calculating the lithography threshold model. Through the example analysis, in order to reduce the influence on the lithography energy, the resistance value of the pulsed xenon lamp should be controlled within 1 Ω, and the error of the exposure time delay is controlled within 2 ms, which provides a theoretical basis for the lithography and control method of high-precision grating scale calculation.