Low-Temperature Fabrication (≤ 150 °C) of High-Quality Sputtered Silicon Oxide Thin Film with Hydrogen Plasma Treatment

TaeWon Seo,Hyuk Park,Gilsu Jeon,Ju-Young Yun,Seongmin Park,Suwon Seong,Yoonyoung Chung

Low-Temperature Fabrication (≤ 150 °C) of High-Quality Sputtered Silicon Oxide Thin Film with Hydrogen Plasma Treatment

2020

TaeWon Seo
Hyuk Park
Gilsu Jeon
Ju-Young Yun
Seongmin Park
Suwon Seong
Yoonyoung Chung

Low-temperature fabrication of thin-film dielectrics is essential for various applications including flexible/stretchable electronics, monolithic three-dimensional integrated circuits, and large-ar...

Keywords:

Materials science
Thin film
Silicon oxide
Optoelectronics
Fabrication
Plasma

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