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The Switching Characteristics of a-Si TFT Fabricated by Ion Doping Technique
The Switching Characteristics of a-Si TFT Fabricated by Ion Doping Technique
1991
Yasuhiro Mitani
Hirohisa Tanaka
Hiroshi Morimoto
Mitsuo Ishii
K. Awane
Keywords:
Nanotechnology
Thin-film transistor
Doping
Analytical chemistry
Ion
Materials science
ion doping
Optoelectronics
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