A process for producing a resist pattern

A method of forming a resist pattern comprising a step (1), in which on a substrate by using a resist composition comprising a base component which shows in an alkaline developing solution an increased solubility, and a photobase generator component that generates a base upon exposure , a resist film is formed; a step (2) in which the resist film is subjected to an exposure; a step (3) in which, after step (2) heating is carried out so that the exposed portion of the resist film, the base generated from the photobase generator component upon exposure and an acid added to the resist film before was neutralized and the solubility of the base component in an alkaline developing solution is increased by the action of an acid, which was added to the resist film in advance, in the unexposed part of the resist film; and a step (4) in which the resist film to an alkaline development is subjected, whereby a negative resist pattern is formed in which the unexposed part of the resist film was dissolved and removed.