High silica waveguides on alumina substrates for hybrid optoelectronic integration

High-silica optical waveguides are fabricated on alumina substrates by flame hydrolysis deposition (FHD) and reactive ion etching (RIE) patterning techniques. The composition of the high-silica glass waveguides is adjusted from that of the conventional FHD glass to reduce the thermal expansion mismatch between silica glass and alumina. Glass waveguides made in this way exhibit low loss and are compatible with various types of alumina ceramic substrates. >