Preparation method of SiO2 film in two-dimensional ordered hexagonal close packing structure

The invention relates to a preparation method of a SiO2 film in a two-dimensional ordered hexagonal close packing structure, and solves the technical problems that the existing method of preparing SiO2 colloidal crystals in hexagonal close packing structures is low in repeatability, the film is uncontrollable, the cost is high, and the area is small. The preparation method comprises the following steps: (1) preparing SiO2 particle dispersing liquid, (2) cleaning a glass substrate, (3) performing amination on a glass slide, (4) modifying nano SiO2 with cetyl trimethyl ammonium bromide, (5) preparing spreading liquid, and (6) putting the glass slide subjected to the amination and the spreading liquid into a system to obtain the SiO2 film on the surface of the glass slide subjected to the amination, and drying and sintering the SiO2 film, so as to obtain the SiO2 film in the two-dimensional ordered hexagonal close packing structure. The SiO2 film in the two-dimensional ordered hexagonal close packing structure has the advantages of large area, high degree of order and small particle size; in addition, the film is highly controllable, the repeatability is high, and the cost is low.