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In Situ Processing of InP by Flash LPCVD for Surface Preparation and Gate Oxide Deposition
In Situ Processing of InP by Flash LPCVD for Surface Preparation and Gate Oxide Deposition
1988
Nissim
Licoppe
Moison
Meriadec
Keywords:
In situ
Optoelectronics
Oxide
surface preparation
Deposition (chemistry)
AND gate
Chemical vapor deposition
flash
Materials science
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