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Sub-25nm FinFET with advanced fin formation and short channel effect engineering
Sub-25nm FinFET with advanced fin formation and short channel effect engineering
2011
Yamashita
Basker
Standaert
Yeh
Yamamoto
Maitra
Lin
Faltermeier
Kanakasabapathy
Wang
Sunamura
Jagannathan
Reznícek
Schmitz
Inada
Adhikari
Berliner
Lee
Kulkarni
Zhu
Kumar
Bryant
Wu
Kanarsky
Cho
McLellan
Holmes
Johnson
Levin
Demarest
Li
Oldiges
Arnold
Colburn
Hane
Mcherron
Paruchuri
doris
Miller
Bu
Khare
ONeill
Leobandung
Keywords:
Doping
Degradation (geology)
Logic gate
Short-channel effect
Annealing (metallurgy)
Silicon
Fin (extended surface)
Optoelectronics
Materials science
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