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A comprehensive evaluation of major phase shift mask technologies for isolated gate structures in lo
A comprehensive evaluation of major phase shift mask technologies for isolated gate structures in lo
1994
Lars W. Liebmann
Thomas Harold Newman
Richard A. Ferguson
Ronald M. Martino
Antoinette F. Molless
Mark O. Neisser
J. Tracy Weed
Keywords:
Logic synthesis
Electronic engineering
Electrical engineering
Materials science
Phase-shift mask
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