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ZnO- and TiO2-Based Semiconductor Films Prepared by Plasma Enhanced CVD Without any Carrier Gas
ZnO- and TiO2-Based Semiconductor Films Prepared by Plasma Enhanced CVD Without any Carrier Gas
2009
Yingbin Lin
Yun Yang
Xiaowei Li
Zufang Huang
Keywords:
Optoelectronics
SQUID
Photoluminescence
Ion implantation
Plasma
X-ray crystallography
Magnetic semiconductor
Semiconductor
X-ray photoelectron spectroscopy
Materials science
Zinc compounds
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