Modeling of excimer-laser direct-projection deep etching of photoresist and its application
1999
A model of laser projection ablation for micropatterning on polymers is established by analyzing the optical imaging features and the UV laser interaction with polymers. This model is applied to explain the experimental phenomenon such as ablated pattern size stability and the taper angle of pattern edge successfully.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI