A smart batch type RTA technology for beyond 256 Mbit DRAM
1995
A new hot wall type rapid thermal annealing (H-RTA) technology using a vertical batch furnace has been developed. This technology provides junctions with shallow and high concentration and slip free process with high throughput. We have demonstrated that H-RTA is a promising candidate for device fabrications beyond 256 Mbit DRAM in cost as well as in performance.
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