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0.5 Micron Gate CMOS Technology Using E-Beam/Optical Mix Lithography
0.5 Micron Gate CMOS Technology Using E-Beam/Optical Mix Lithography
1986
Leo K. Wang
Y. Taur
David C. Moy
Robert H. Dennard
Kaolin Grace Chiong
F. M. Hohn
P. J. Coane
A. Edenfeld
S. Carbaugh
Douglas S. Kenney
St. Schnur
Keywords:
Micrometre
Physical therapy
Lithography
CMOS
Electronic engineering
Medicine
Electron beam processing
Correction
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