Oblique Ion Nano-Texturing Technology for Longitudinal Recording Media

We propose a novel texturing technology using off-normal ion beam etching for longitudinal recording glass media. The structure spontaneously forms for a comparatively short time without a template and can uniformly cover the whole surface. It is possible to precisely control the width by the beam condition. The ripple structure also induces Co c-axis alignment to the same direction and improves read and write (R/W) properties and thermal stability more effectively than the current mechanical texture.