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Modeling of Aluminum Etching in a Commercial High Density Plasma Reactor Using BCl_3/Cl_2/Ar Gas Mixtures
Modeling of Aluminum Etching in a Commercial High Density Plasma Reactor Using BCl_3/Cl_2/Ar Gas Mixtures
1998
S. J. Choi
P Ho
A. Ting
E. Meeks
Keywords:
Analytical chemistry
Materials science
high density
plasma reactor
Aluminium
Etching
Correction
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