Old Web
English
Sign In
Acemap
>
Paper
>
A Study of Photo Resist Compatibility to Copper Bath during Applied Current
A Study of Photo Resist Compatibility to Copper Bath during Applied Current
2014
Ui-Hyoung Lee
Ho-Nyun Park
Yuji Morishima
Tomoko Hatsukade
Takuya Takahashi
Jinho Choi
Jaihyung Won
Keywords:
Compatibility (mechanics)
Photoresist
Copper
Composite material
Electrical engineering
Materials science
Nanotechnology
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]