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Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
2008
Seokhoon Kim
Sanghyun Woo
Hyung-Chul Kim
Inhoe Kim
Keun Woo Lee
Wooho Jeong
Taeyong Park
Hyeongtag Jeon
Keywords:
Atomic layer epitaxy
Atomic physics
Physics
Thin film
Nuclear magnetic resonance
Atomic layer deposition
Remote plasma
Layer by layer
Condensed matter physics
Optoelectronics
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