Micro processing by intense fast electron beams

Summary form only given, as follows. The generation of intense electron beams by superposing two discharges namely low pressure DC glow discharge and a high current pulsed discharge (at gas pressures and voltages very similar to the pseudospark gap devices) has been reported. Small diameter, high peak current and short pulse length are the characteristics of the electron beam generated as a result of this technique. No high-vacuum facilities are necessary. Many applications such as micro processing, X-rays generation, high-power laser pre-ionization are feasible. Electron beam current is in the range of 10-30 A. The most energetic part of the electron beam has about 5-nanosecond pulse duration. The beam is magnetically deflected to the specific point. The pulse repetition rate is up to 100 Hz. Micro-processing as drilling tenths of microns diameter holes in different materials as copper, titanium, tantalum was performed. The microstructure of the irradiated materials was investigated by means of atomic force microcopy and SEM. The possibility to process a matrix of holes, which can act as a multiple hollow cathode, is considered.