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Acemap > Paper > C 2 F 6 / O 2 and C 3 F 8 / O 2 Plasmas SiO2 Etch Rates, Impedance Analysis, and Discharge Emissions

C 2 F 6 / O 2 and C 3 F 8 / O 2 Plasmas SiO2 Etch Rates, Impedance Analysis, and Discharge Emissions

1999 
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