Создание наноразмерного медного покрытия в виде дифракционной линзы на поверхности кварца

Creation of a diffraction binary lens on the basis of galvanic besieged copper for work in a x-ray range of lengths of waves is described. The relief was formed of a layer of the resist put on an initial copper film, by means of electronic lithograph. Experiments showed presence after manifestation of a resist thin, nonconducting a film current on an initial copper surface. It interferes with further galvanic sedimentation of a continuous layer of copper. Therefore, further researches should be directed on working off of a mode of lithograph for the purpose of study of a layer of a resist for full thickness.