Photochemical Microetching of InP

For the fabrication of microwave or optoelectronic devices on InP materials, different etching techniques are used such as classical chemical etching, or preferential chemical etching following crystallographic orientation [1,2], or plasma etching and photoetching [3–7]. With our scanning optical microscope, the light spot is used to etch photochemically n-type InP samples immersed in several basic or acidic solutions.