Stable poly(fullerene oxide) thin films derived from hexanitro[60]fullerene

A new approach for the fabrication of poly(fullerene oxide) thin films that are stable up to 800 K and above by thermal treatment of hexanitro[60]fullerene is described. The reaction proceeds via the rearrangement of fullerenic nitro moieties and cleavage of the –O–NO bond in the nitrito groups; spectroscopic and mass spectrometric evidence for the oligomeric structure is presented.