Submicron photomanipulation of self-assembled polydiacetylenes

Abstract A new class of soluble, processable polydiacetylenes(PDA) derived from the alkoxycarbonylmethyl-and related urethanes of 9-(aryl-5, 7-nonadiyn-1-ol has been designed and synthesized. The aryl groups used include N-methyl-anilino, diphenylamino, and 9-carbazolyl. These PDA are susceptible to postpolymerization functionalization via the aryiamine and ester groups. Examples of the former include tricyanovinylation and diazonium salt coupling. The latter materials are the first rigid rod polymers to allow direct photofabrication of regular surface relief gratings, as revealed by atomic force microscopy(AFM).