Electric field induced metallic behavior in thin crystals of ferroelectric {\alpha}-In2Se3.

A ferroelectric field effect transistor (FeFET) that may potentially integrate the data storage and logic functions in the same circuitry can also be used as a platform to study the properties of the ferroelectric material itself. Thin crystals of {\alpha}-In2Se3, a ferroelectric transition metal chalcogenide semiconductor featuring van de Waals interlayer coupling and an energy gap of around 1.4 eV, was used in this work as the channel material as opposed to the gate dielectric of the FeFET. These FeFETs, which feature a back gate of heavily doped Si and a gate dielectric of 300 nm thick thermally grown SiO2, were measured down to liquid helium temperatures. They were found to show good electric field effect functions and electric field effect induced metallic behavior, along with possible signs for the existence of polarization domains.