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Pre-Amorphization and Low-Temperature Implantation for Efficient Activation of Implanted As in Ge(100)
Pre-Amorphization and Low-Temperature Implantation for Efficient Activation of Implanted As in Ge(100)
2006
Hideki Murakami
Shinya Hamada
Takahiro Ono
Kuniaki Hashimoto
Akio Ohta
Hiroaki Hanafusa
Seiichiro Higashi
Seiichi Miyazaki
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