Фотолитография на пленочных структурах ксерогель/пористый анодный оксид алюминия, сформированных в различных электролитах

The results of study the morphology of the microstructured porous anodic alumina films formed using electrochemical anodization, sol-gel synthesis, photolithography and chemical etching are given. The metal mask was not used in photolithography, because of fabrication the continuous xerogel film. The perspective of application of these structures in planar optoelectronics and photocatalyses are discussed.