Fabry-Perot type antireflective coatings for binary mask applications in ArF and F/sub 2/ excimer laser lithographies
2003
We demonstrated an antireflective coating structure based on a Fabry-Perot structure for binary masks of ArF and F/sub 2/ excimer laser lithographies. Reflectance of less than l% at both 193 and 157 nm can be achieved.
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