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Atomic layer deposition: Low temperature process well adapted to ULSI and TFT technologies
Atomic layer deposition: Low temperature process well adapted to ULSI and TFT technologies
2017
Ahmad Chaker
Pierre Szkutnik
P. Gonon
Christophe Vallée
Ahmad Bsiesy
Keywords:
Thin-film transistor
High-κ dielectric
Atomic layer deposition
Materials science
Electronic engineering
Nanotechnology
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