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Tailored synthesized silsesquioxane based resists for UV assisted nanoimprint lithography
Tailored synthesized silsesquioxane based resists for UV assisted nanoimprint lithography
2011
Mustapha Chouiki
N. Kehagias
M. Zelsmann
Rainer Schoeftner
C. M. Sotomayor Torres
Keywords:
Nanotechnology
Nanoimprint lithography
Silsesquioxane
Resist
Materials science
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