Comparison of the formation process and properties of epitaxial graphenes on Si- and C-face 6H—SiC substrates

In this paper, the epitaxial graphene layers grown on Si- and C-face 6H—SiC substrates are investigated under a low pressure of 400 Pa at 1600 °C. By using atomic force microscopy and Raman spectroscopy, we find that there are distinct differences in the formation and the properties between the epitaxial graphene layers grown on the Si-face and the C-face substrates, including the hydrogen etching process, the stacking type, and the number of layers. Hopefully, our results will be useful for improving the quality of the epitaxial graphene on SiC substrate.