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Effects of Oxidizer in Metal CMP Slurry on Open Circuit Potential Change during Metal Polishing
Effects of Oxidizer in Metal CMP Slurry on Open Circuit Potential Change during Metal Polishing
2006
Shohei Shima
Shintaro Kamioka
Shingo Yasuda
Hidekazu Nagano
Yutaka Wada
Katsuhiko Tokushige
Akira Fukunaga
Manabu Tsujimura
Keywords:
Polishing
Slurry
Materials science
Metal
Open-circuit voltage
Composite material
Metallurgy
Correction
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