Study on the dark-field illumination for near-field microscope using anamorphic optics to inspect defects on semiconductor wafers

General approaches to realize higher sensitivity in optical inspection system are using shorter wavelength including UV and higher NA for objective lens. Extreme performances of imaging and illumination systems in a situation of wellmatched to each other are inevitable for the further effort on an effective optical detection of fine defects in patterned wafer. This study focused on the dark-field illumination method in near-field condition with simple modification of far-field imaging and illumination system which is designed by anamorphic optics and the potential of it is derived from experimental methods.