A Method for Determining Trap Distributions of Specific Channel Surfaces in InGaAs Tri-Gate MOSFETs

We present a method for estimating the trap distributions on each of the surfaces in a multi-gate MOSFET. We perform I–V hysteresis measurements on InGaAs Tri-gate MOSFETs with various channel widths (25, 60, and 100 nm) from which top surface and side wall trap distributions are determined. We show that the total trap distribution of a device can be expressed as a linear combination of the top surface and side wall trap distributions. The results show that the minimum trap density of the top InGaAs (100) surface is smaller than that of the {110} side walls by almost an order of magnitude. Since the nanowire constituting the channel in these devices is selectively regrown, rather than etched out, the different trap distributions can be explained by the specific surface chemistries of two surfaces.