Apparatus for processing plasma

The invention provides a plasma treatment device which comprises an outer shell which is provided with a reaction chamber in the interior, a bottom electrode which is arranged in the reaction chamber and a cantilever support device which goes through the outer shell and which supports the bottom electrode; the cantilever support device is pivotally arranged at the side wall of the outer shell andcan independently rotate in the outer shell; The plasma treatment device further comprises a location device so as to selectively fix the relative position of the cantilever support device and the outer shell. The plasma treatment device provided by the invention neglects the step of taking the bottom electrode out of the reaction chamber and the existence of the step is one reason for the more complex maintenance work process of the plasma treatment device. Therefore, the plasma treatment device provided by the invention remarkably simplifies the maintenance operation, saves the maintenance cost and time and causes the utilization efficiency of the plasma treatment device to be remarkably improved.