Evaluation of Reliability of Transparent SiOCH by Electrochemical Methods

Three types of SiOCH coatings for organic light emitting diodes (OLEDs) were deposited on type 316 stainless steel by plasma enhanced chemical vapor deposition (PECVD). The reliability of coatings deposited at three different RF plasma powers was evaluated by potentiodynamic tests and electrochemical impedance spectroscopy (EIS). The EIS data were monitored for 10 days in an undisturbed environment to determine coating performance as a function of plasma power. The performance of SiOCH film on stainless steel, which included low porosity due to the enhanced formation of Si–O bonding configuration, improved with increasing plasma power.