Old Web
English
Sign In
Acemap
>
Paper
>
Higher-Order Lithography: Double-Deprotected Chemically Amplified Photoresists (DD-CAMP)
Higher-Order Lithography: Double-Deprotected Chemically Amplified Photoresists (DD-CAMP)
2017
Deanna Soucie
William Earley
Kenji Hosoi
Arata Takahashi
Takashi Aoki
Brian Cardineau
Koichi Miyauchi
Robert L. Brainard
Keywords:
Photochemistry
Photoresist
Lithography
Materials science
Extreme ultraviolet lithography
Kinetics
Correction
Source
Cite
Save
Machine Reading By IdeaReader
2
References
0
Citations
NaN
KQI
[]