Study on effects of substrate temperature on growth and structure of alignment carbon nanotubes in plasma-enhanced hot filament chemical vapor deposition system
2006
Abstract Alignment carbon nanotubes (ACNTs) were synthesized on silicon substrate coated with Ni catalyst film and Ta buffer layer by plasma-enhanced hot filament chemical vapor deposition using CH 4 , NH 3 , and H 2 as the reaction gas, and they were investigated by scanning electron microscopy and transmission electron microscopy. It is found that the diameter of the bamboo-structured ACNTs is increased from 62 to 177 nm when the substrate temperature was changed from 626 to 756 °C. Their growth rate is enhanced by the substrate temperature in a range of 626–683 °C and it is reversely reduced with the substrate temperature after the substrate temperature is over 683 °C. Beginning with wetting phenomenon, the effects of the substrate temperature on the structure and growth rate of the ACNTs are analyzed.
Keywords:
- Hybrid physical-chemical vapor deposition
- Chemical vapor deposition
- Scanning electron microscope
- Carbon nanotube supported catalyst
- Substrate (chemistry)
- Carbon nanotube
- Materials science
- Catalysis
- Inorganic chemistry
- Phenomenon
- Chemical engineering
- Silicon
- Transmission electron microscopy
- Analytical chemistry
- Nanotechnology
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
16
References
7
Citations
NaN
KQI