Lighting system for microlithography

An illumination system for microlithography is used for illuminating an illumination field with illumination light from a primary light source. A first scanning assembly (12) has beam-shaping first raster elements (24) which are arranged adjacent in a first plane of the illumination system or to this. The first scanning assembly (12) serves to generate a raster array of secondary light sources. Relay optics serves to overlapping transmission of the illumination light of the secondary light sources in the illumination field. The relay optics has a second screen assembly (15) with beam-shaping second raster elements (26). Each one of the raster elements (24) of the first scanning assembly (12) is associated with one of the raster elements (26) of the second screen assembly (15) for guiding an entire bundle of the illumination light of a sub beam (25). The first scanning assembly (12) has at least two types (I, II, III) of the first raster elements (24), which differ in their bundle influencing action. The grid elements (24, 26) of the two grid arrays (12, 15) are arranged to each other such that each grid element type (I to III) at least one individual Abstandt (Δ The result is a lighting system, particular with the influence ...