Oxometalato based formulations activated by peroxide for etching waste disposal.

An aqueous formulation alkaline combining with peroxide for cleaning a microelectronic device, the formulation comprising: (a) water, (b) at least one free base of metal ions sufficient to produce a final formulation having an alkaline pH (c) amounts from about 0.01% to about 5% by weight (expressed as% SiO2) of at least one corrosion inhibitor based free silicate soluble metal ions in water; (D) from about 0.01% to about 10% by weight of at least one metal chelating agent, and (e) more than 0 to about 2.0% by weight of at least one oxometalato.