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CHARACTERISTICS OF P-SILICON THIN FILMS PREPARED BY RADIO FREQUENCY MAGNETRON SPUTTERING
CHARACTERISTICS OF P-SILICON THIN FILMS PREPARED BY RADIO FREQUENCY MAGNETRON SPUTTERING
2008
Y. Z. Chiou
W. C. Hsieh
Keywords:
Sputter deposition
High-power impulse magnetron sputtering
Thin film
Analytical chemistry
Silicon
Materials science
Radio frequency
silicon thin film
Optoelectronics
radio frequency magnetron sputtering
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