Old Web
English
Sign In
Acemap
>
Paper
>
Oxidation of Low-Pressure-Chemical-Vapour Deposited Silicon Oxynitride Films
Oxidation of Low-Pressure-Chemical-Vapour Deposited Silicon Oxynitride Films
1989
A. E. T. Kuiper
M. F. C. Willemsen
J. M. L. Mulder
J. B. Oude Elferink
R. Erens
F.H.P.M. Habraken
W. F. van der Weg
Keywords:
Silicon oxynitride
Inorganic chemistry
Materials science
Chemical engineering
Correction
Source
Cite
Save
Machine Reading By IdeaReader
16
References
0
Citations
NaN
KQI
[]