Nitrides of Chromium and Chromium‐Titanium Alloys New Film‐Type Resistance Elements

1955 
Some electrical properties of nitrided Cr and nitrided Cr‐Ti films are presented. Films of chromium and chromium‐titanium alloys, deposited on ceramic bases by vacuum‐evaporation methods, were nitrided to form electrical resistance elements. By varying thickness and nitriding conditions, the electrical properties of the films can be varied. Materials can be prepared with temperature coefficients of resistance less than 0.01%/°C. Resistors with resistances of from several hundred to several million ohms can be made. Resistance to environmental attack and other properties are also described.
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