Structure of oxygen, boron and nickel ion implanted silica glasses

Abstract The structure of silica glass damaged by 1 MeV O + -, 1 MeV B + - and 4 MeV Ni 2+ -ion implantations has been investigated by X-ray diffraction, infrared reflection and ultraviolet absorption measurements. It is found that Si atoms form SiO 4 tetrahedra in the damaged regions, as in the unimplanted glass. It is deduced that the average Si-O-Si bond angle decreases with ion implantations. The middle range ordering becomes reduced in the damaged regions. The structure of glasses damaged by the implantations of these ions resemble each other.