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Reactive Ion Etching of SiC and SiCN using Tetrafluoroethane and Oxygen
Reactive Ion Etching of SiC and SiCN using Tetrafluoroethane and Oxygen
2004
J. Andrew McDonald
Casey Martinez
K. Radican
Eric Botello
Deborah C. Koeck
David Donnelly
Wilhelmus J. Geerts
Gregory Spencer
Heather Claire Galloway
Keywords:
Oxygen
Reactive-ion etching
Inorganic chemistry
Chemistry
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