A Theoretical View on the Dielectric Properties of Crystalline and Amorphous High-κ Materials and Films

We review recent and current theoretical work on several aspects of the dielectric response and dynamical properties of oxides used as dielectric layers in microelectronics. A personal choice of studies are singled out, on crystalline, amorphous, and alloy phases as well as thin films, mostly with focus on rare-earth and transition-metal “high-κ” compounds, as well as a selection of important work on silica.