Facet mirror for a projection exposure system

The invention relates to a facet mirror 100, in particular for use as an optical component in a projection exposure apparatus for EUV microlithography, with at least two mirror modules 105 which individual mirrors 110 and mirror module surfaces 129 and at least one side having a non-reflective border area 120, and a module edge 121, wherein adjacent individual mirror 110 have in the mirror modules 105 spaced apart a distance which is less than half the width of the non-reflecting edge region 120 and the at least two adjacent module edges 121 of adjacent mirror modules 105 offset by a height along the surface normal 135 of the two mirror module surfaces 129 relative to one another are.