Internal Image Potential in Semiconductors - Effect on Scanning-Tunneling-Microscopy

The tunneling of electrons from a semiconductor surface to a metal tip, across a vacuum gap, is influenced by two image interactions: an attractive image potential in the vacuum region, which lowers the apparent tunneling barrier, and a repulsive image potential in the semiconductor interior, which raises it for conduction-band electrons. We report on detailed calculations of tunneling currents and apparent barrier heights for a model metal-vacuum-semiconductor junction which utilize semiclassical dielectric functions to compute the image potential in all three regions